The paper presents an empirical formula for the dependence of the “optical gap” value in the nonideal plasma radiation (absorption) spectra on Ne within the electron concentration of 10¹⁷cm⁻³ ≤Ne ≤ 10²²cm⁻³. A comparison ...

The influence of the bias voltage on the silicon etching rate in the plasma-chemical reactor (PСR) with controlled magnetic fields have been investigated. The dependences of the silicon etching rate on the power, discharge ...